K. Allaert, A. Van Calster, H. Loos en A. LequesneA Comparision Between Silicon Nitride Films Made by PCVD of N2-SiH4/Ar and N2-SiH4/He Journal of the Electrochemical Society, Vol. 132(7), pp. 1763-1766 (1984)
S. Zhang, M. Vereeken, J. De Baets, A. Van Calster, J. Peeters en K. AllaertThe realisation of photo-via technology using multiposit as a photo imageable dielectric Proceedings of the 3rd European Conference on Electronic Packaging Technology & 9th International Conference on Interconnection Technology in Electronics (EuPac `98), pp. 62-65 (1998)
M. Vrana, A. Van Calster, R. Vanden Berghe en K. AllaertInterconnection technology for advanced high density thick films Proceedings of the 10th European Microelectronics Conference, pp. 190-198 (1995)
Vanden Berghe R, S. Demolder, M. Saille, K. Allaert, A. De Bruycker, A. Van Calster, J. Capon, J. De Baets, I. De Rycke, H. De Smet, J. Doutreloigne en J. VanfleterenFailure Mechanisms in Dielectrics Proceedings of the 8th European Hybrid Microelectronics Conference, pp. 157-164 (1993)
K. Allaert, A. Van Calster en A. VervaetP.C.V.D. SIN Conformal Coatings for the Improvement of the Reliability of Wire Bonded Chips International Symposium on the Physical and Failure Analysis of Integrated Circuits, pp. (1986)
K. Allaert, A. Van Calster en A. VervaetEvaluation of PCVD silicon nitride as total passivation layer for chips Proceedings of the 5th VLSI Packaging Workshop, pp. 26 (1986)
K. Allaert, A. Van Calster en A. VervaetEvaluation of PCVD Silicon Nitride as a Total Passivation Layer for Chips 5th VLSI Packaging Workshop, pp. 26 (1986)
K. Allaert en A. Van CalsterEvaluation of P.C.V.D. Silicon Nitride as a Thin Film Isolator, as a Cross Over Dielectric Film and as a Passivation Layer Proceedings 3th Int. Conference on Plasma Etching and Plasma Deposition, pp. 239-243 (1985)
K. Allaert en A. Van CalsterThe Influence of the Deposition and Annealing Temperature on Plasma Enhanced Chemical Vapour Deposition of Si3N4 The 6th International Conference on Thin Films, pp. (1984)
Koen AllaertKarakterisatie van P.E.C.V.D. Siliciumnitride en Toepassing als totale Passivatielaag voor Chips. Doctoraatsproefschrift Faculteit Toegepaste Wetenschappen, Universiteit Gent, pp. (1987)
K. Allaert en J. MercierOntwerp van een N-Mos OpAmp in Dunne Film (2 exemplaren) Afstudeerwerk FTW, RUG, pp. (1981)
K. Allaert en J. MercierOntwerp van een N-MOS opamp in dunne film Verhandeling ingediend voor de prijs van de KBVE 1981, pp. (1981)