Equipment

Vacuum equipment

• Leybold-Hereaus UNIVEX 450 evaporator
  (now mainly used for the deposition of metals)
• Microchemistry F-120 Atomic Layer Deposition (ALD) reactor
  (deposition of Al₂O₃, ZnS, ZnO)

Other equipment

• EKRA type E1 screen-printer
  (thick-film BaTiO₃, PtAg)
• KSV dip-coater
  (used for sol-gel layers)
• ATV PEO 601 furnace

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